E-MRS Spring Meeting 1999, Symposium P
 
 

SESSION III : Nondestructive characterization of complex structures and devices
 
 

Wednesday Afternoon - I
 
 
 
 
 
  First Autor Title Where from ?
       
14.00-14.30 Chen, W.M. (invited) Application of optically detected magnetic resonance in semiconductor layered structures  <abstract>  Linköping/Sweden
14.30-15.00 Fried, M. (invited) Nondestructive optical depth profiling & real-time evaluation of spectroscopic data 
<abstract> 
Budapest/Hungary
15.00-15.15 Coonan, B. Investigation of SiGe heterostructures using non-destructive optical techniques Cork, Ireland
15.15-15.30 Ferrieu, F. Variable angle spectroscopic ellipsometry of SiGe/Si composition graded profiles of strained heterostructures for hetero-junction bipolar transistors. Meylan/ France
 

Friday Morning - II
 
 
 
 
 
  First Autor Title Where from ?
- coffee break - 

 

     
       
10.45-11.05 Finkman, E. The dielectic response function in epitaxial SiGeC layers grown on Si Haifa/Israel
11.05-11.25 Röseler, A. Characterization of thin films on semiconductor surfaces by infra-red ellipsometry Berlin, Germany
11.25-11.45 Bukkems, H. Analysis of 
In( 1-x)Ga(x)As(y)P(1-y) based layer stacks using spectroscopic ellipsometry in the NIR spectroscopic range
Delft/NL
11.45-12.00 Boher, P. A new combined instrument with uv-visible and far-infrared spectroscopic ellipsometry: application to semiconductor characterization Bois Colombes/ Fr
12.00-12.15 Henrion, W. Optical properties and energy band structure of  Ru2Si3 and Ru2Ge3 Berlin/Deutschland
12.15-12.30 Murtagh, M. InGaP/GaAs Heterojunction-Bipolar-Transistor (HBT) electronic properties Cork/Ireland
Poster      
  Wilson, P. T. Frequency domain interferometric second harmonic spectroscopy  Austin/ Texs/ USA
  Nayar, V. Spectroscopic ellipsometry characterization of advanced dielectrics  Malvern/ U.K.
  Bauer, M. Time resolved reflectivity ... Stuttgart/Germany
  Cuadras, A. Optical characterization of thermally oxidized Si1-x-yGexCy layers Barcelona/Spain
  Djurišic, A.B. Optical dielectric funktion of semiconductors Dresden/Germany
  Boher, P. A new combined system including spectroscopic ellipsometry and grazing X-ray reflectance Bois Colombes/Fra
  Moriarty, G.R. Optical and structural properties of InGaP/GaAs heterostructures  Cork/ Ireland
  Moumains, Kh  Light and heavy hole excitons in absorption and magnetoabsorption spectra of InGaAs/GaAs MQWs St. Petersburg,Rus
  Lohner, T. Ion implantation induced damage depth profile in silicon studied by ellipsometry and Rutherford backscattering spectrometry Budapest/ Hungary
  Shi, J.L. Defect related photoluminescence of SiGe/Si heterostructures grown by APCVD Delf, NL
   Simoen, E. Impact of neutron irradiation on optical performance of InGaAsP laser diodes Leuven/Belgium
  Masenelli, B. Fabrication and characterization of semiconductor-based microcavities Ecully/France
  Polit, J. The application of the reflection-absorption spectroscopy to the seciconductor thin films Rzeszow/Poland
  Piotrowski, T. Application of infrared extended source transmission for bonding control of silicon wafers Warsaw/ Poland
  Tonova, D.A. Depth profiling of graded index structures by optical methods Sofia/Bulgaria
  Toušková Photovoltage measurement for ... Prague/Czech R.
  Holiney, R. Yu. Electrorefectance spectroscopy of PLD Hg1-xCdxTe films on Si substrates Kyiv/ Ukraine
  Kulik, M. Ellipsometric studies of optical constants of ion implanted GaAs and Si layers Lublin/Poland
  Piotrowski, T. Thermooptical method of carrier distribution visualisaton in semiconductors Warsaw/ Poland
  Dmitruk, N.L. Ultraviolet responsivity control in Schottky barrier heterostructures with textured interface Kiev/Ukraine
  N.R.Agamalyan OPTICAL AND PHOTOELECTRIC PROPERTIES OF PT, PZT AND PLZT THIN FILMS  
AND INFRARED REFLECTIVITY SPECTRA PZT(52/48) AND COPPER DOPED PT THIN  
FILMS
Ashtarak, Armenia
  Glinchuk, K.D. Characterization of residual carbon in undoped semi-insulating GaAs by low temperature (77K) photoluminescence Kiev/Ukraine
  Romanyuk, B:N. Effect of in situ ultrasound treatment on the structure of ion-beam modified layer in silicon Kiev/ Ukraine
  Shpotyuk, O.I. Infrared spectroscopy of ternary chalcogenide semiconductors for optical application Lviv/Ukraine
  Khlyap, G. Optical properties of heterostructures based on A2B6materials Dragobyc/Ukraine
  Schram, T. The use of visible- (VIS-SE) and infrared spectroscopic ellipsometry (IR-SE) for the characterization of surface treated aluminum Brussels/Belgium
  Kovalenko, V.F. Radiative recombination in  GRaDED-Bandgap AlGaAs allys Odessa/Ukraine